99.7% Alumina Wafer Polohi Papa Kiʻi Hōʻike ʻia

99.7% Alumina Wafer Poloka Papa

ʻO ka wehewehe pōkole:

ʻO Chemshun 99.7% Al2O3 Alumina substrate ma ke ʻano he mea maʻemaʻe kiʻekiʻe a me ka nui o nā mea hou, loaʻa iā ia nā waiwai kino maikaʻi a me nā ʻano kemika paʻa, ke kumu kūʻai maikaʻi e hoʻohālikelike ʻia me nā mea ʻē aʻe.Ke hoʻomau mau nei ka alumina maʻemaʻe kiʻekiʻe e ka noiʻi kiʻekiʻe o ka honua a me nā seramika kiʻekiʻe a me nā hale hana seramika maikaʻi.

99.7% Alumina Wafer Polishing Plate no ka Mechanical Polishing.Ma ke ʻano he mea nui o ka CMP chemical mechanical polishing kaʻina.Pono ka CMP no ka hana ʻana i ke kaʻina hana o ka sapphire a me ka Wafer o nā semiconductor.

ʻO China Ceramic Liner 'maʻemaʻe kiʻekiʻe 99.7% alumina ceramics sapphire polishing a me ka lapping plates, ua hoʻohālikelike ʻia ka disc e like me ke kaʻina hana PIBM.He ʻenehana holomua kūloko kūloko.Hoʻopau maikaʻi ʻo PIBM i ka pilikia nui o ka māwae a me ka deformation o ka nui alumina ceramics. E wehe ka ʻenehana PIBM i kekahi puka aniani o nā seramika maikaʻi.

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

Palapala noi

E like me ka Alumina ceramic wafer polishing a me ka sapphire lapping disks i hoʻohana ʻia i ka semi-conductive, diamond polishing etc.

Kaʻina hana: ʻO nā ʻano hana a pau o ka Polishing a me ka lapping, e like me CMP chemical mechanical polishing, Mechanical Polishing, Precision Polishing.

Hiʻona

ʻO ka maʻemaʻe kiʻekiʻe a me ka lōʻihi o ke kemika
Kiekie Mechanical ikaika a paakiki
Kū'ē Kū'ē kiʻekiʻe
Pale Voltage Kiʻekiʻe
Kūleʻa ka wela kiʻekiʻe a hiki i 1700ºC
Hana Kū'ē Kū'ē Loa
Hana Hoʻomākaʻikaʻi maikaʻi
ʻO nā ʻano āpau āpau 180,360, 450, 600mm etc

Inoa mea kūʻai	99.7 kiʻekiʻe maʻemaʻe Alumina ceramic Polishing Lapping Discs
Mea waiwai	99.7% alumina
Nui maʻamau	D180, 360, 450, 600mm, ʻae ʻia ka nui maʻamau.
kalakala	ʻelepani
Palapala noi	ʻO Wafer a me Sapphire CMP kaʻina hana i ka ʻoihana semi-conductive
Min.Kauoha	1Pic

ʻIke Kemika / kino

		Unite	99.7 Alumina Seramika
Na Waiwai Nui	Al2O3 maʻiʻo	wt%	99.7-99.9
	ʻO ka mānoanoa	gm/cc	3.94-3.97
	kalakala	-	ʻelepani
	Ka hoʻoheheʻe wai	%	0
Na Waiwai Mechanical	ʻO ka ikaika hoʻololi (MOR) 20 ºC	Mpa(psix10^3)	440-550
	Modulus Elastic 20ºC	GPa (psix10^6)	375
	ʻO Vickers Paʻakikī	Gpa(kg/mm2) R45N	>=17
	Kulou ikaika	Gpa	390
	Ikaika U'i 25ºC	MPa(psix10^3)	248
	'O'ole'a Ha'i (KI c)	Mpa* m^1/2	4-5
Na Waiwai wela	ʻO ka hoʻoili wela (20ºC)	W/mk	30
	Coefficient o ka hoonui wela (25-1000ºC)	1x 10^-6/ºC	7.6
	ʻO ke kū ʻana i ka haʻalulu wela	ºC	200
	Ka wela hoʻohana kiʻekiʻe	ºC	1700
Pono Uila	Ka ikaika dielectric (1MHz)	ac-kv/mm(ac v/mil)	8.7
	Dielectric mau (1 MHz)	25ºC	9.7
	Kū'ē Volume	ohm-cm (25ºC)	>10^14
		ohm-cm (500ºC)	2×10^12
		ohm-cm (1000ºC)	2×10^7

lawelawe

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